A Chinese company has developed two new lithography machines domestically that are capable of chip manufacturing at the 65nm node and below. This marks progress in China’s goal of reducing reliance on foreign chipmaking tools.
One machine has a resolution below 65nm and an overlay accuracy under 8nm. The other has a resolution of 110nm and overlay accuracy of 25nm.
These new tools still trail the capabilities of industry leaders like ASML and Nikon. ASML’s least advanced machines have a resolution below 38nm and overlay accuracy of 1.3nm.
The new Chinese machines represent an advancement but are not yet commercially available. Details of the developing companies were not disclosed.
China has long sought to reduce dependence on foreign lithography suppliers like ASML, but still lags significantly in capabilities. Their best domestic toolmaker Shanghai Microelectronics Equipment is only capable of 90nm processing.
The development indicates ongoing efforts by China to boost its domestic chipmaking sector but it remains well behind industry leaders in key lithography technologies critical for advanced node semiconductor manufacturing.
Source: Toms Hardware
